![]() Spectroreflectometers rely on accurate values of refractive index dispersion (the change in RI as a function of wavelength) to calculate thickness. Reflectivity measurements of titanium nitride antireflective coatings at the stepper exposure wavelength are straightforward, but direct optical thickness measurements of TiN layers have been difficult to make. Typical process control techniques are optical measurement of reflectivity of film thickness, or four-point probe measurements of sheet resistance monitor wafers. Titanium nitride (TiN) is increasingly used in multilevel metallization processing for a variety of applications: as an antireflective coating, an aluminum diffusion barrier layer and a tungsten interconnect and plug adhesion layer. Application of spectroscopic ellipsometer technology to titanium nitride process monitoring Application of spectroscopic ellipsometer technology to titanium nitride process monitoring
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